Surface Treatment Processor
CVD stands for Chemical Vapor Deposition.
CVD is a method for depositing dense adhesive solid layers of uniformthickness in which a gaseous mixture is decomposed and deposited on the workpiece surface as
surface of product and gas deposit by chemical reactions.
|Type of equipment||1H-1L||1H-1||1H-1S|
|Coating chamber processing area dimensions||φ490×950mm||φ360×900mm||φ250×500mm|
|Coating temperature||750～1050°C（depending on type of coating applied）|
|Rate of deposition||3μm/h（depending on type of coating applied）|
|Number of coating layers||TiC, TiC+TiCN+TiN|
|Power supply||220V 50/60Hz/cps|
Active Screen Plasma Nitriding Furnace
This furnace forms glow discharge between the furnace wall and the screen,
increases the temperature of the material by heat radiation from the screen, and modifies the surface of a workpiece with the activated species that pass through the screen.
As the furnace does not form glow discharge on the surface of the workpiece, uneven modification (edge effect, hollow-cathode effect) due to the shape of the workpiece can be avoided.