製品紹介

Surface Treatment Processor

CVD Process

CVD Process
CVDプロセス

CVD stands for Chemical Vapor Deposition.
CVD is a method for depositing dense adhesive solid layers of uniformthickness in which a gaseous mixture is decomposed and deposited on the workpiece surface as
surface of product and gas deposit by chemical reactions.

仕様及び寸法

Type of equipment 1H-1L 1H-1 1H-1S
Coating chamber processing area dimensions φ490×950mm φ360×900mm φ250×500mm
Coating temperature 750~1050°C(depending on type of coating applied)
Rate of deposition 3μm/h(depending on type of coating applied)
Number of coating layers TiC, TiC+TiCN+TiN
Power supply 220V 50/60Hz/cps
Power consumption 135kw 50kwφ 30kw

Active Screen Plasma Nitriding Furnace

アクティブスクリーンプラズマ窒化装置
アクティブスクリーンプラズマ窒化装置

This furnace forms glow discharge between the furnace wall and the screen,
increases the temperature of the material by heat radiation from the screen, and modifies the surface of a workpiece with the activated species that pass through the screen.
As the furnace does not form glow discharge on the surface of the workpiece, uneven modification (edge effect, hollow-cathode effect) due to the shape of the workpiece can be avoided.

PAGETOP